Physics and technology of high-k gate dielectrics I : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, Reliability, and Manufacturing Issues, held in Salt Lake City, Utah, October 20-24, 2002
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Contributions
- Kar, S. 1942- - Contributor
- Electrochemical Society. Dielectric Science and Technology Division. - Contributor
- Electrochemical Society. Electronics Division. - Contributor
Publication
2003 - Electrochemical Society, Pennington, NJ, New Jersey
Language
English
Word Count
76,000 words, Guess
Page Count
304 pages
Identifiers
- ISBN-101566773954
- ISBN-139781566773959
- Library of Congress Control Number2003109748
- Open LibraryOL18014492M
Classifications
- LCCTK7895.G36 I478 2002
Subjects
Genres
- Congresses
Other Editions
- Physics and technology of high-k gate dielectrics I : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, Reliability, and Manufacturing Issues, held in Salt Lake City, Utah, October 20-24, 2002
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