Author

Contributions

  • SpringerLink (Online service) - Contributor

Publication

2013 - Springer Berlin Heidelberg, Berlin, Heidelberg, Germany

Language

English

Word Count

81,500 words, Guess

Page Count

326 pages

Physical Format

[electronic resource] :

Identifiers

Classifications

  • DDC537.622
  • LCCQC610.9-611.8

Description

Introduction to Epitaxy provides the essential information for a comprehensive upper-level graduate course treating the crystalline growth of semiconductor heterostructures. Heteroepitaxy represents the basis of advanced electronic and optoelectronic devices today and is considered one of the top fields in materials research. The book covers the structural and electronic properties of strained epitaxial layers, the thermodynamics and kinetics of layer growth, and the description of the major growth techniques metalorganic vapor phase epitaxy, molecular beam epitaxy and liquid phase epitaxy. Cubic semiconductors, strain relaxation by misfit dislocations, strain and confinement effects on electronic states, surface structures and processes during nucleation and growth are treated in detail. The Introduction to Epitaxy requires only little knowledge on solid-state physics. Students of natural sciences, materials science and electrical engineering as well as their lecturers benefit from elementary introductions to theory and practice of epitaxial growth, supported by pertinent references and over 200 detailed illustrations.

Subjects

Series Statement

  • Graduate Texts in Physics

Links

Other Editions

  • Epitaxy of Semiconductors: Introduction to Physical Principles[electronic resource] :Springer Berlin Heidelberg2013-01-01

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