Chemical vapour deposition
precursors, processes and applications
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Contributions
- Jones, Anthony C. - Contributor
- Hitchman, Michael L. - Contributor
Publication
2009 - Royal Society of Chemistry, Cambridge, UK, England
Language
English
Word Count
145,500 words, Guess
Page Count
582 pages
Identifiers
- Internet Archivechemicalvapourde00jone
- ISBN-100854044655
- ISBN-139780854044658
- Library of Congress Control Number2009419379
- OCLC Control Number319518113
and 3 more
- OCLC Control Number244653597
- Better World Books9780854044658
- Open LibraryOL23947810M
Classifications
- DDC671.735
- LCCTS695 .C535 2009
- LCCTS695 .C67 2009
and 1 more
- LCCTS695
Alternate Titles
- Chemical vapor deposition
Subjects
Topics
Vapor-platingTECHNOLOGY & ENGINEERINGChemical vapor depositionDépôt chimique en phase vapeurTechnical & Manufacturing Industries & Trades
Other Editions
- Chemical vapour deposition: precursors, processes and applications
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