Gate Stack and Silicide Issues in Silicon Processing
Symposium Held April 25-27, 2000, San Francisco, California, U.S.A (Materials Research Society Symposia Proceedings, V. 611.)
Our rough guess is there are 59,000 words in this book.
At a pace averaging 250 words per minute, this book will take 3 hours and 56 minutes to read. With a half hour per day, this will take 8 days to read.
How long will it take you?
This book will take an estimated to read at a reading speed averaging words per minute. With 30 minutes per day, this will take to read.
Enter your reading speedYou can take one of our WPM reading speed tests to find your reading speed.
Create a free account to track your reading progress, build your reading list, and set reading goals.
Contributions
- L. A. Clevenger (Editor) - Contributor
- S. A. Campbell (Editor) - Contributor
- P. R. Besser (Editor) - Contributor
- S. B. Herner (Editor) - Contributor
- J. Kittl (Editor) - Contributor
Publication
2000-07-01 - Materials Research Society
Language
English
Word Count
59,000 words, Guess
Page Count
236 pages
Physical Format
Hardcover
Identifiers
- ISBN-101558995196
- ISBN-139781558995192
- Goodreads2351989
- Library of Congress Control Number2001018059
- OCLC Control Number45708210
and 2 more
- Better World Books9781558995192
- Open LibraryOL12091964M
Classifications
- LCCTK7874.76 .G38 2001
- DDC621.39/5
Subjects
Topics
Other Editions
- Gate Stack and Silicide Issues in Silicon Processing: Symposium Held April 25-27, 2000, San Francisco, California, U.S.A (Materials Research Society Symposia Proceedings, V. 611.)
Reader Reviews
No reviews yet for this book.
Be the first to share your thoughts!