Plasma etching and reactive ion etching
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Author
Publication
1982 - American Institute of Physics, New York, N.Y, New York (State)
Language
English
Word Count
21,750 words, Guess
Page Count
87 pages
Identifiers
- Internet Archiveplasmaetchingrea0000cobu
- ISBN-100883184060
- ISBN-139780883184066
- Goodreads4413994
- Library of Congress Control Number82073342
and 1 more
- Open LibraryOL3512720M
Classifications
- DDC621.381/7
- LCCTK7871.85 .C577 1982
Alternate Titles
- Reactive ion etching.
Subjects
Series Statement
- American Vacuum Society monograph series
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