Advanced Technologies Based on Wave and Beam Generated Plasmas
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Author
Contributions
- Shivarova, A. - Contributor
Publication
1999 - Springer Netherlands, Dordrecht, Netherlands
Language
English
Word Count
142,250 words, Guess
Page Count
569 pages
Physical Format
Electronic resource
Identifiers
- Open LibraryOL27014690M
- ISBN-139789401706339
- ISBN-109401706336
- OCLC Control Number859588586
Classifications
- DDC539.7092
- LCCQC770-798
- LCCQC702.7.H42
and 1 more
- LCCQC793.5.H32-793.5.H329
Alternate Titles
- Proceedings of the NATO Advanced Study Institute, Sozopol. Bulgaria, May 22-June 1, 1998
Description
This book draws together three areas of work on plasma technologies: advanced efforts based on wave generated, high frequency plasmas, plasma assisted ion implantation, and electron beam generated plasma. It encompasses all the links in the progress from fundamentals to applications: the description and modelling of different plasma sources to technological use; from general diagnostics to methods related to technological control and operation of plasma reactors. The book lays a foundation for the application of sources in industry (in high-tech electronics, microelectronics, IC fabrication, plasma chemistry, lighting, new materials, optics, the biomedical industry, aerospace, etc.), and in astrophysics, atomic physics, laser physics, accelerator physics and microwave devices.
Subjects
Series Statement
- NATO ASI Series, 3. High Technology -- 67
Other Editions
- Advanced Technologies Based on Wave and Beam Generated Plasmas
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