Advances in Research and Development, Volume 23
Modeling of Film Deposition for Microelectronic Applications (Thin Films)
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Contributions
- Maurice H. Francombe (Series Editor) - Contributor
- John L. Vossen (Series Editor) - Contributor
Publication
1997-09-29 - Academic Press
Language
English
Word Count
77,750 words, Guess
Page Count
311 pages
Identifiers
- ISBN-100125330235
- ISBN-139780125330237
- Goodreads1683555
- Open LibraryOL7328435M
Subjects
Other Editions
- Advances in Research and Development, Volume 23: Modeling of Film Deposition for Microelectronic Applications (Thin Films)
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