Chemical Vapor Deposition (Surface Engineering Series, V. 2)
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Contributions
- Jong-Hee Park (Editor) - Contributor
- T. S. Sudarshan (Editor) - Contributor
Publication
2001-08-01 - ASM International
Language
English
Word Count
120,250 words, Guess
Page Count
481 pages
Physical Format
Hardcover
Identifiers
- Internet Archivechemicalvapordep00park_738
- Internet Archivechemicalvapordep00park
- ISBN-100871707314
- ISBN-139780871707314
- Goodreads6754758
and 3 more
- Library of Congress Control Number2001022339
- OCLC Control Number46402293
- Open LibraryOL9784296M
Classifications
- LCCTS695 .C52 2001
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